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Diode Lasers

  • Eutectic Bonding

  • Thermal Management

  • Thermal Stress
    Control

  • Interface Materials
    and Surface
    Engineering

  • Test Analysis and
    Diagnosis

  • Eutectic Bonding

    Hard solder & totally Indium-free die bonding process, which can effectively prevent the creep, electromigration, and thermal fatigue of indium solder, has been applied to manifold high power diode lasers based on the CTE matched substrate with high thermal conductivity to enhance their lifetime and reliability.
  • Thermal Management

    Optimizing design in packaging structure and using advanced material with high thermal conductivity effectively improve the ability of heat dissipation to ensure a higher output power.
  • Thermal Stress
    Control

    Theoretical study and analysis of the mechanism of thermal stress on the performance of high-power diode lasers enable us to develop the advanced thermal management technology which can lower and homogenize the thermal stress, and improve the device performance, e.g., lower smile, higher degree of polarization (DoP) and narrower spectrum.
  • Interface Materials
    and Surface
    Engineering

    A specific technology of the surface treatment process was developed to enhance the characteristics of the surface state of bonding materials for the increase of adhesive strength and long-time reliability of die bonding. Thin-film Gold-tin eutectic solder has been developed in-house, and the composition can easily be adjusted for fulfilling the stable and reliable indium-free die bonding.
  • Test Analysis and
    Diagnosis

    Thanks to our studies on the mechanism of high-power diode laser performance, the optimized structure of the diffusion barrier layer, and the development of the corresponding preparation process technology, the reliability and the stability of the bonding interface have been greatly improved.

Laser Optics

  • Wafer-level
    Laser Optics
    Manufacturing

  • Photolithography-RIE (reactive ion etching) for Wafer-Level Precision Optics Manufacturing

  • Nanoimprint Precision Optics Manufacturing

  • Beam Transformation System (BTS)

  • Beam Homogenization

  • Wafer-level
    Laser Optics
    Manufacturing

    Preparing 12-inch (300mm×300mm) glass micro-optics wafers and refractive micro-lens elements (ROE) based on wafer-level simultaneously structured manufacturing technology enable precise shaping and control of many types of laser beams zero-dimensionally (point), one-dimensionally (line), and two-dimensionally (area), to meet different application requirements.
  • Photolithography-RIE (reactive ion etching) for Wafer-Level Precision Optics Manufacturing

    A precise micro and nano-optical manufacturing technique for optics components based on silicon and fused silica.
    Utilizes photolithography and reactive ion etching (RIE) to achieve accurate shaping, sizing, and positioning.
    Enables batch manufacturing of high-precision micro and nano-optical structures on wafers up to 8 inches in size.
  • Nanoimprint Precision Optics Manufacturing

    Involving precision alignment of custom-designed imprint molds with wafers, polymer micro and nano-optical structures are then imprinted and cured on glass wafers, forming single or double-sided micro and nano lens structures. 
    The wafer is subsequently cut into independent arrays of micro and nano lenses according to design requirements. 
    This process yields optically stable products with the advantages of low cost and ease of large-scale manufacturing.
  • Beam Transformation System (BTS)

    The BTS transforms the asymmetrical far-field distribution of a diode laser bar into a nearly symmetrical beam parameter product.
  • Beam Homogenization

    Focuslight homogenizers can produce many different beam shapes, making them extremely versatile in use.
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